Reactive sputtering of zirconium with oxygen
- 1 September 1976
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 37 (3), L73-L75
- https://doi.org/10.1016/0040-6090(76)90596-4
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- The deposition rate of metallic thin films in the reactive sputtering processThin Solid Films, 1975
- Reactive sputtering of TiC with oxygenThin Solid Films, 1975
- Oxidation of lead films by rf sputter etching in an oxygen plasmaJournal of Applied Physics, 1974
- Argon ion etching in a reactive gasJournal of Materials Science, 1973
- Reactive sputtering of metals in oxidizing atmospheresThin Solid Films, 1973
- Some Properties of Silica Film Made by RF Glow Discharge SputteringJapanese Journal of Applied Physics, 1970
- Effect of Oxygen on the rf-Sputtering Rate of SiO2Journal of Vacuum Science and Technology, 1968
- Cesium-Ion Bombardment of Aluminum Oxide in a Controlled Oxygen EnvironmentJournal of Applied Physics, 1967
- Cesium Ion Sputtering of AluminumJournal of Applied Physics, 1966
- Dielectric Thin Films through rf SputteringJournal of Applied Physics, 1966