Argon ion etching in a reactive gas
- 1 December 1973
- journal article
- Published by Springer Science and Business Media LLC in Journal of Materials Science
- Vol. 8 (12), 1711-1716
- https://doi.org/10.1007/bf02403521
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Analyses de couches minces de silice par emission ionique secondaireMaterials Research Bulletin, 1971
- Handbook of Thin Film TechnologyJournal of the Electrochemical Society, 1971
- High-resolution Positive Resists for Electron-beam ExposureIBM Journal of Research and Development, 1968
- Cesium-Ion Bombardment of Aluminum Oxide in a Controlled Oxygen EnvironmentJournal of Applied Physics, 1967
- Cesium Ion Sputtering of AluminumJournal of Applied Physics, 1966
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961