Silicon dioxide thin films prepared by photochemical vapor deposition from silicon tetraacetate
- 1 September 1993
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 232 (2), 201-203
- https://doi.org/10.1016/0040-6090(93)90009-e
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Silicon Dioxide Thin Films Prepared by Chemical Vapor Deposition from Silicon TetraacetateJapanese Journal of Applied Physics, 1989
- Silicon Dioxide Thin Films Prepared by Thermal Decomposition of Silicon TetraacetateJapanese Journal of Applied Physics, 1988
- Direct photochemical deposition of SiO2 from the Si2H6+O2 systemJournal of Applied Physics, 1984