Diffusion kinetics in AlSi composition-modulated films by isothermal resistivity-annealing
- 30 June 1990
- journal article
- Published by Elsevier BV in Materials Science and Engineering B
- Vol. 6 (2-3), 171-177
- https://doi.org/10.1016/0921-5107(90)90093-q
Abstract
No abstract availableKeywords
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