Oxidation kinetics of SiC deposited from CH3SiCl3/H2 under CVI conditions
- 1 January 1992
- journal article
- research article
- Published by Springer Science and Business Media LLC in Journal of Materials Science
- Vol. 27 (12), 3330-3334
- https://doi.org/10.1007/bf01116033
Abstract
No abstract availableKeywords
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