Film growth and mechanism of LICVD of chromium films from Cr(CO)6 at 248 nm
- 1 October 1988
- journal article
- Published by Springer Science and Business Media LLC in Applied Physics A
- Vol. 47 (2), 171-181
- https://doi.org/10.1007/bf00618882
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Mechanisms of carbon and oxygen incorporation into thin metal films grown by laser photolysis of carbonylsJournal of Applied Physics, 1987
- Laser Processing of Thin Films and MicrostructuresPublished by Springer Science and Business Media LLC ,1987
- Deposition of refractory metal films by rare-gas halide laser photodissociation of metal carbonylsJournal of Applied Physics, 1986
- Chemical Processing with LasersPublished by Springer Science and Business Media LLC ,1986
- Photothermal effect contribution on film quality improvement in excimer-laser induced metal CVDApplied Physics A, 1985
- Low-temperature refractory metal film depositionApplied Physics Letters, 1982
- Laser photodeposition of refractory metalsApplied Physics Letters, 1981
- Multiphoton ionization of metal atoms produced in the photodissociation of group VI hexacarbonylsChemical Physics Letters, 1980
- Efficient multiphoton ionization of metal carbonyls cooled in a pulsed supersonic beamChemical Physics, 1979
- Production of excited metal atoms by UV multiphoton dissociation of metal alkyl and metal carbonyl compoundsChemical Physics Letters, 1978