Low-temperature refractory metal film deposition
- 1 December 1982
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 41 (11), 1048-1050
- https://doi.org/10.1063/1.93389
Abstract
We have deposited uniform films of Mo, W, and Cr over large areas (>5 cm2) using UV laser photodissociation of their respective hexacarbonyls. The depositions were made at room temperature over pyrex and quartz plates, as well as silicon wafers. We have examined the resistivity, reflectivity, stress, and step coverage of these films.Keywords
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