Growth mechanism of reactively sputtered aluminum nitride thin films
- 1 February 2002
- journal article
- Published by Elsevier BV in Materials Science and Engineering: A
- Vol. 325 (1-2), 380-388
- https://doi.org/10.1016/s0921-5093(01)01477-0
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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