A new method for measuring the flatness of large and thin silicon substrates using a liquid immersion technique
- 9 October 2015
- journal article
- Published by IOP Publishing in Measurement Science and Technology
- Vol. 26 (11)
- https://doi.org/10.1088/0957-0233/26/11/115008
Abstract
No abstract availableKeywords
Funding Information
- National Science and Technology Major Project of China (2014ZX02504001)
- State Key Development Program for Basic Research of China (2011CB013201)
- National High Technology Research and Development Program of China (2013AA040104)
- Australia Research Council (ARC) Future Fellowship Program
- National Natural Science Foundation of China (91323302)
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