Fabrication and vacuum annealing of transparent conductive AZO thin films prepared by DC magnetron sputtering
- 13 December 2002
- journal article
- Published by Elsevier BV in Vacuum
- Vol. 68 (4), 363-372
- https://doi.org/10.1016/s0042-207x(02)00544-4
Abstract
No abstract availableThis publication has 26 references indexed in Scilit:
- Resistivity of polycrystalline zinc oxide films: current status and physical limitJournal of Physics D: Applied Physics, 2001
- Blue shift in room temperature photoluminescence from photo-chemical vapor deposited ZnO filmsThin Solid Films, 2001
- New n-Type Transparent Conducting OxidesMRS Bulletin, 2000
- ZnO thin films prepared by remote plasma-enhanced CVD methodJournal of Crystal Growth, 2000
- Highly transparent and conductive rare earth-doped ZnO thin films prepared by magnetron sputteringThin Solid Films, 2000
- Optical and electronic properties of transparent conducting ZnO and ZnO:Al films prepared by evaporating methodThin Solid Films, 1999
- Influence of the doping and annealing atmosphere on zinc oxide thin films deposited by spray pyrolysisVacuum, 1999
- Optical and electrical characteristics of aluminum-doped ZnO thin films prepared by solgel techniqueJournal of Crystal Growth, 1998
- Transparent ZnO:Al films prepared by co-sputtering of ZnO:Al with either a Zn or an Al targetThin Solid Films, 1996
- Highly Transparent and Conductive Zn2In2O5 Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1995