Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films
- 1 September 2018
- journal article
- research article
- Published by Elsevier BV in Journal of Alloys and Compounds
- Vol. 771, 373-381
- https://doi.org/10.1016/j.jallcom.2018.08.327
Abstract
No abstract availableKeywords
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