Overview of the impact of downscaling technology on 1∕f noise in p-MOSFETs to 90 nm
- 1 January 2004
- journal article
- Published by Institution of Engineering and Technology (IET) in IEE Proceedings - Circuits, Devices and Systems
- Vol. 151 (2), 102
- https://doi.org/10.1049/ip-cds:20040459
Abstract
No abstract availableKeywords
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