High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
- 1 January 1998
- journal article
- Published by Elsevier BV in Sensors and Actuators A: Physical
- Vol. 64 (1), 33-39
- https://doi.org/10.1016/s0924-4247(98)80055-1
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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