Evaluation of a Praseodymium Precursor for Atomic Layer Deposition of Oxide Dielectric Films
- 23 October 2004
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 16 (24), 5162-5168
- https://doi.org/10.1021/cm0401793
Abstract
No abstract availableKeywords
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