Layer-to-Layer Grating Coupler Based on Hydrogenated Amorphous Silicon for Three-Dimensional Optical Circuits
- 19 November 2012
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 51 (12R)
- https://doi.org/10.1143/jjap.51.120203
Abstract
A high-index-contrast grating coupler based on hydrogenated amorphous silicon (a-Si:H) was demonstrated as a layer-to-layer coupler. a-Si:H was deposited by plasma-enhanced chemical vapor deposition and vertically stacked with SiO2 for multilayer integration. The distance between the multilayer waveguides was fixed to 1 µm for optical isolation. The grating coupler pair was fabricated on the basis of simulation results. From the measurements of a fabricated grating coupler in the C-band, the maximum coupling efficiency was estimated to be 22%.Keywords
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