Influence of the Angle of Incidence on Sputtering Yields
- 1 November 1959
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 30 (11), 1762-1765
- https://doi.org/10.1063/1.1735051
Abstract
Small metal spheres are bombarded by uniform Hg+ ion beams of low energy (125 to 800 ev). Comparison of shadow micrographs of the spheres before and after sputtering makes it possible to determine the influence of the angle of incidence on sputtering yields. Fe, Ta, and Mo showed a pronounced increase in yield at more oblique incidence of the ions while Au, Ag, and Pt showed this effect only slightly.Keywords
This publication has 3 references indexed in Scilit:
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957
- Momentum Transfer in Sputtering by Ion BombardmentJournal of Applied Physics, 1954
- Über die Kathodenzerstäubung bei schiefem Aufparall der IonenThe European Physical Journal A, 1942