Sputtering Yields for Normally IncidentHg+-Ion Bombardment at Low Ion Energy

Abstract

Sputtering yields for 26 metals under normally incident ${\mathrm{Hg}}^{+}$-ion bombardment were measured in the energy range 30 ev to 400 ev. The targets were immersed like large negative Langmuir probes in a low-pressure (1 μ) Hg plasma of high density (ion current densities up to 15 ma/${\mathrm{cm}}^2$). Absolute yield values were obtained by measuring the weight loss from the target; relative values by measuring the speed with which sputtered material is deposited on a movable glass-ribbon collector.