Electrical, optical and annealing characteristics of ZnO:Al films prepared by spray pyrolysis
- 20 March 1991
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 198 (1-2), 67-74
- https://doi.org/10.1016/0040-6090(91)90325-r
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Effect of applied external magnetic field on the relationship between the arrangement of the substrate and the resistivity of aluminium-doped ZnO thin films prepared by r.f. magnetron sputteringThin Solid Films, 1988
- Highly conductive and transparent ZnO thin films prepared by r.f. magnetron sputtering in an applied external d.c. magnetic fieldThin Solid Films, 1985
- Hydrogen plasma interactions with tin oxide surfacesThin Solid Films, 1984
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- The stability of zinc oxide transparent electrodes fabricated by R.F. magnetron sputteringThin Solid Films, 1984
- Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysisThin Solid Films, 1983
- Transparent conductors—A status reviewThin Solid Films, 1983
- Degradation of ITO Film in Glow-Discharge PlasmaJapanese Journal of Applied Physics, 1981
- Optical and electrical properties of ZnO films prepared by spray pyrolysis for solar cell applicationsJournal of Vacuum Science and Technology, 1979
- The infrared spectrum of hydrogen chemisorbed on zinc oxideJournal of Catalysis, 1962