Thickness dependent physical and photocatalytic properties of ITO thin films prepared by reactive DC magnetron sputtering
- 14 January 2011
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 257 (7), 3075-3080
- https://doi.org/10.1016/j.apsusc.2010.10.119
Abstract
No abstract availableThis publication has 37 references indexed in Scilit:
- Influence of the film thickness on the structure, optical and electrical properties of ITO coatings deposited by sputtering at room temperature on glass and plastic substratesSemiconductor Science and Technology, 2008
- Thickness Dependence of Resistivity and Optical Reflectance of ITO FilmsChinese Physics Letters, 2008
- Light‐Extraction Enhancement of GaInN Light‐Emitting Diodes by Graded‐Refractive‐Index Indium Tin Oxide Anti‐Reflection ContactAdvanced Materials, 2008
- Photocatalytic Activity of Sol−Gel TiO2 Thin Films on Various Kinds of Glass Substrates: The Effects of Na+ and Primary Particle SizeThe Journal of Physical Chemistry B, 2004
- Low temperature deposition of ITO thin films by ion beam sputteringThin Solid Films, 2000
- Effect of mass transfer and catalyst layer thickness on photocatalytic reactionAIChE Journal, 2000
- Microstructure of Low-Resistivity Tin-Doped Indium Oxide Films Deposited at 150∼200°CJapanese Journal of Applied Physics, 1995
- Studies on the electrical and optical properties of reactive electron beam evaporated indium tin oxide filmsJournal of Physics D: Applied Physics, 1993
- An Analysis of Charge Transfer Rate Constants for Semiconductor/Liquid InterfacesAnnual Review of Physical Chemistry, 1991
- Derivation of charge transfer parameters at semiconductor-liquid interfacesApplications of Surface Science, 1985