Low temperature deposition of ITO thin films by ion beam sputtering
- 12 December 2000
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 377-378, 81-86
- https://doi.org/10.1016/s0040-6090(00)01388-2
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Synthesis of silicon carbide thin films by ion beam sputteringThin Solid Films, 1998
- Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputteringThin Solid Films, 1997
- Microstructure and Electrical Characteristics of Sputtered Indium Tin Oxide FilmsJournal of the Electrochemical Society, 1993
- Post-deposition annealing effects in RF reactive magnetron sputtered indium tin oxide thin filmsSolar Energy Materials and Solar Cells, 1992
- Optical and Photovoltaic Characteristics of In‐Modified SnO2 Thin FilmsJournal of the Electrochemical Society, 1990
- Plasma Metalorganic Chemical Vapor Deposition of Indium Oxide Thin FilmsJapanese Journal of Applied Physics, 1989
- Transparent, conducting indium tin oxide films formed on low or medium temperature substrates by ion-assisted depositionApplied Optics, 1987
- Transparent conductors—A status reviewThin Solid Films, 1983
- Thin metallic oxides as transparent conductorsThin Solid Films, 1982
- Anomalous Optical Absorption Limit in InSbPhysical Review B, 1954