The Electrical and Optical Properties of the ZnO-SnO2 Thin Films Prepared by RF Magnetron Sputtering
- 16 January 1992
- journal article
- research article
- Published by Wiley in physica status solidi (a)
- Vol. 129 (1), 181-191
- https://doi.org/10.1002/pssa.2211290116
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- CdO-SnO2 Thin Films Prepared by DC Sputtering with Oxide Targetsphysica status solidi (a), 1991
- Preparations of ZnO:Al transparent conducting films by d.c. magnetron sputteringThin Solid Films, 1990
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- Properties of tin doped indium oxide thin films prepared by magnetron sputteringJournal of Applied Physics, 1983
- Transparent Conducting Cadmium‐Tin Oxide Films Deposited by RF Sputtering from a CdO ‐ SnO2 TargetJournal of the Electrochemical Society, 1980
- Chemical Vapor Deposition of Antimony‐Doped Tin Oxide Films Formed from Dibutyl Tin DiacetateJournal of the Electrochemical Society, 1976
- Characterization of transparent conductive thin films of indium oxideJournal of Vacuum Science and Technology, 1975
- Optical and Electrical Properties ofSn: A Defect SemiconductorPhysical Review B, 1972
- Highly Conductive, Transparent Films of Sputtered In[sub 2−x]Sn[sub x]O[sub 3−y]Journal of the Electrochemical Society, 1972
- Devitrification of Tin Oxide Films (Doped and Undoped) Prepared by Reactive SputteringJournal of the Electrochemical Society, 1965