Influence of Barrier Growth Temperature on the Properties of InGaN/GaN Quantum Well
- 1 September 2001
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 40 (9R), 5302-5303
- https://doi.org/10.1143/jjap.40.5302
Abstract
In this study we investigate the effect of barrier growth temperature on the properties of InGaN/GaN multiple quantum wells. Double-crystal X-ray diffraction of MQW structures indicates that increasing the barrier growth temperature will reduce the well thickness. However, the photoluminescence peak wavelength shift is greater than the change of in the effective bandgap due to the reduction of well width. In addition to the reduction of well width, the determination of the origin of the significant blue shift in the photoluminescence peak wavelength should also take the strain effect into account.This publication has 8 references indexed in Scilit:
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