On the influence of reactive gases on sputtering and secondary ion emission
- 1 July 1978
- journal article
- Published by Springer Science and Business Media LLC in Applied Physics A
- Vol. 16 (3), 271-278
- https://doi.org/10.1007/bf00885122
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Sputtering of metals in the presence of reactive gasesThin Solid Films, 1977
- Sputtering—Surface changes induced by ion bombardmentProgress in Surface Science, 1976
- An electronic aperture for in-depth analysis of solids with an ion microprobeInternational Journal of Mass Spectrometry and Ion Physics, 1976
- Sputtering of Iron with Ion Beams of O2+, N2+and Ar+Japanese Journal of Applied Physics, 1976
- Depth-profiling of Cu-Ni sandwich samples by secondary ion mass spectrometryApplied Physics A, 1975
- Comparison of the properties of different materials used as masks for ion-beam etchingJournal of Vacuum Science and Technology, 1975
- Design of a combined ion and electron microprobe apparatusInternational Journal of Mass Spectrometry and Ion Physics, 1971
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Surface Cleaning by Cathode SputteringJournal of Applied Physics, 1960
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957