Contrast analysis in two-beam laser interference lithography
- 12 June 2020
- journal article
- research article
- Published by Optica Publishing Group in Applied Optics
- Vol. 59 (18), 5399-5407
- https://doi.org/10.1364/ao.393741
Abstract
Interference lithography enables large area, sub-µm, periodic patterning without photomasks or projection lithography tools. We show that optical contrast, which is the fundamental design variable of interference lithography, enforces coupled constraints on source coherence, beam pointing stability, field size, polarization state, and the intensity balance between beams. The analysis enables selection and alignment tolerance of components to meet a specific design requirement. In particular, the analysis reveals that grating beam splitters are significantly less sensitive to beam pointing and polarization misalignment than plate beam splitters.Funding Information
- Sandia National Laboratories
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