Laser interference lithography for nanoscale structuring of materials: From laboratory to industry
- 30 June 2009
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 86 (4-6), 937-940
- https://doi.org/10.1016/j.mee.2008.12.043
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- High-speed fabrication of large-area nanostructured optical devicesMicroelectronic Engineering, 2008
- Antireflective nanostructured microlensesMicroelectronic Engineering, 2008
- Periodic sub-micrometric structures using a 3D laser interference patternApplied Surface Science, 2007
- Laser interference metallurgy: A new method for periodic surface microstructure design on multilayered metallic thin filmsApplied Surface Science, 2007
- Fabrication of large-area 3D photonic crystals using a holographic optical elementOptics and Lasers in Engineering, 2006
- Laser interference lithography as a new and efficient technique for micropatterning of biopolymer surfaceBiomaterials, 2005
- Fabrication of two-dimensional photonic crystals using interference lithography and electrodeposition of CdSeApplied Physics Letters, 2001
- Limits of lithographyProceedings of the IEEE, 2001
- High aspect-ratio holographic photoresist gratingsApplied Optics, 1988
- The Use of Photoresist as a Holographic Recording MediumApplied Optics, 1970