Selective photosensitivity of metal–oxide–semiconductor structures with SiOx layer annealed at high temperature
- 30 August 2020
- journal article
- research article
- Published by Springer Science and Business Media LLC in Journal of Materials Science: Materials in Electronics
- Vol. 31 (20), 17412-17421
- https://doi.org/10.1007/s10854-020-04297-4
Abstract
No abstract availableKeywords
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