Microstructural characterization of thin SiOx films obtained by physical vapor deposition
- 25 October 2010
- journal article
- Published by Elsevier BV in Materials Science and Engineering B
- Vol. 174 (1-3), 132-136
- https://doi.org/10.1016/j.mseb.2010.03.007
Abstract
No abstract availableKeywords
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