Morphological and Compositional Studies on Al/Ti/TiN/Si, Al/TiN/Si, Al/W/Si, Al/WN/Si Systems to Test the Diffusion Barrier Properties of Nanoscale-Thick Layers between Al and Si
Open Access
- 21 July 2021
- journal article
- research article
- Published by MDPI AG in Micromachines
- Vol. 12 (8), 849
- https://doi.org/10.3390/mi12080849
Abstract
In this work, an investigation of the properties of nanoscale-thick Ti/TiN, TiN, W, WN layers as diffusion barriers between Si and Al is carried out in view of Si-based electronic applications. Heat treatments were performed on the samples to activate interdiffusion between Si and Al. Changing annealing time and temperature, each sample was morphologically characterized by scanning electron microscopy and atomic force microscopy and compositionally characterized by Rutherford backscattering analysis. The aim is to evaluate the efficiency of the layers as diffusion barriers between Si and Al and, at the same time, to evaluate the surface morphological changes upon annealing processes.Keywords
Funding Information
- Catania University (Programma di ricerca di ateneo UNICT 2020-22 linea 2, Contratto di Sviluppo M9 STMicroelectronics” (CDS_000448))
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