Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition
- 1 July 1983
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 105 (4), 353-366
- https://doi.org/10.1016/0040-6090(83)90318-8
Abstract
No abstract availableKeywords
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