Micro-ultracapacitors with highly doped silicon nanowires electrodes
Open Access
- 21 January 2013
- journal article
- Published by Springer Science and Business Media LLC in Nanoscale Research Letters
- Vol. 8 (1), 38
- https://doi.org/10.1186/1556-276x-8-38
Abstract
Highly n-doped silicon nanowires (SiNWs) with several lengths have been deposited via chemical vapor deposition on silicon substrate. These nanostructured silicon substrates have been used as electrodes to build symmetrical micro-ultracapacitors. These devices show a quasi-ideal capacitive behavior in organic electrolyte (1 M NEt4BF4 in propylene carbonate). Their capacitance increases with the length of SiNWs on the electrode and has been improved up to 10 μFcm−2 by using 20 μm SiNWs, i.e., ≈10-fold bulk silicon capacitance. This device exhibits promising galvanostatic charge/discharge cycling stability with a maximum power density of 1.4 mW cm−2.Keywords
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