Colloquium:Reactive plasmas as a versatile nanofabrication tool
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- 22 June 2005
- journal article
- research article
- Published by American Physical Society (APS) in Reviews of Modern Physics
- Vol. 77 (2), 489-511
- https://doi.org/10.1103/revmodphys.77.489
Abstract
The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the “cause and effect” approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed.
Keywords
This publication has 100 references indexed in Scilit:
- Microwave plasma synthesis of silver nanopowdersMaterials Letters, 2005
- Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3–Ar–H2 plasma treatment for capacitor electrodesMaterials Letters, 2005
- Nanocantilevers made of bent silicon carbide nanowire-in-silicon oxide nanoconesApplied Physics Letters, 2004
- Low-Temperature Growth of Germanium Quantum Dots on Silicon Oxide by Inductively Coupled Plasma Chemical Vapor DepositionChemical Vapor Deposition, 2004
- The effects of RF plasma excitation frequency and doping gas on the deposition of polymorphous silicon thin filmsThin Solid Films, 2004
- Model based comparison of thermal and plasma chemical vapor deposition of carbon nanotubesJournal of Applied Physics, 2003
- The physics and chemistry of dusty plasmasPlasma Physics and Controlled Fusion, 2000
- Experimental confirmation of charged carbon clusters in the hot filament diamond reactorJournal of Crystal Growth, 2000
- Synthesis and characterization of the aligned hydrogenated amorphous carbon nanotubes by electron cyclotron resonance excitationThin Solid Films, 2000
- Thermodynamic approach to the chemical vapor deposition processJournal of Crystal Growth, 1994