Background impurities and a delta-doped QW. Part I: Center doping
- 4 November 2019
- journal article
- research article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 34 (12), 125009
- https://doi.org/10.1088/1361-6641/ab4c7a
Abstract
The influence of shallow background donor impurities on the energy characteristics of the SiGe/Si/SiGe quantum well structure with centered delta-doping is studied numerically. The description of the self-consistent method includes the calculation of the donors impurity binding energy in the delta-layer. The delta-layer impurity binding energy as well as the energy differences between the first quantized electron subbands in the well demonstrate a significant dependence on the characteristics of the background doping. Therefore, the background doping cannot be neglected when studying phenomena like intersubband optical transitions.Keywords
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