Modeling the flux of high energy negative ions during reactive magnetron sputtering
- 1 November 2009
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 106 (9), 093302
- https://doi.org/10.1063/1.3247545
Abstract
The negative ion flux during reactive sputtering from planar and rotating cylindrical magnetrons has been studied. Energy resolved mass spectrometry was used to measure the energy and mass distribution of the negative ions. Also the angular distribution of the high energy ions was characterized for planar as well as for rotating cylindrical magnetrons. Besides these measurements, a binary collision Monte Carlo simulation code, SiMTRA, was adapted in order to simulate the energy, mass, and angular distribution of the high energy negative ions. All simulated distributions, for both planar and rotating cylindrical magnetrons, were in excellent correspondence with the experimental observations. Also a model for the amount of high energy negative O− ions was proposed. Indeed, the logarithm of the amount of high energy negative O− ions is shown to be related to the secondary electron emission yield of the oxide target, and these two parameters are known to be related to the work function. The SiMTRA simulations, in combination with knowledge of the work function or secondary electron emission yield of the target, allow modeling the flux of high energy negative ions during reactive magnetron sputtering.Keywords
This publication has 34 references indexed in Scilit:
- Spectroscopic Ellipsometry Study on Surface Roughness and Optical Property of AZO Films Prepared by Direct-Current Magnetron Reactive Sputtering MethodChinese Physics Letters, 2008
- The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulationJournal of Physics D: Applied Physics, 2008
- Correlation between electron and negative O− ion emission during reactive sputtering of oxidesApplied Physics Letters, 2007
- Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar∕O2 mixturesJournal of Applied Physics, 2006
- Energy distribution of O− ions during reactive magnetron sputteringApplied Physics Letters, 2006
- Influence of the negative oxygen ions on the structure evolution of transition metal oxide thin filmsJournal of Applied Physics, 2006
- Biaxially Aligned Yttria Stabilized Zirconia and Titanium Nitride Layers Deposited by Unbalanced Magnetron SputteringSolid State Phenomena, 2005
- Calculation of the effective gas interaction probabilities of the secondary electrons in a dc magnetron dischargeJournal of Physics D: Applied Physics, 2004
- Energetic oxygen ions in the reactive sputtering of the Zr target in Ar+O2 atmosphereJournal of Vacuum Science & Technology A, 2001
- Mass spectrometry of secondary negative ions emitted from low-energy sputtered YBCO ceramicsJournal of Physics D: Applied Physics, 1995