Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge
- 3 April 2008
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Plasma dynamic in chromium and titanium HIPIMS dischargesJournal of Physics D: Applied Physics, 2007
- Study of the transport of titanium neutrals and ions in the post-discharge of a high power pulsed magnetron sputtering devicePlasma Sources Science and Technology, 2006
- Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively coupled plasmaApplied Physics Letters, 2006
- Plasma dynamics in a highly ionized pulsed magnetron dischargePlasma Sources Science and Technology, 2005
- Spatial electron density distribution in a high-power pulsed magnetron dischargeIEEE Transactions on Plasma Science, 2005
- High power pulsed magnetron sputtered CrNx filmsSurface and Coatings Technology, 2003
- Influence of high power densities on the composition of pulsed magnetron plasmasVacuum, 2001
- Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron dischargeApplied Physics Letters, 2001
- Ionized sputter deposition using an extremely high plasma density pulsed magnetron dischargeJournal of Vacuum Science & Technology A, 2000
- Growth, structure and properties of TiN coatings on steel substratesAIP Conference Proceedings, 1986