Sputter deposition of ultrahard coatings within the system Ti-B-C-N
- 30 June 1990
- journal article
- Published by Elsevier BV in Surface and Coatings Technology
- Vol. 41 (3), 351-363
- https://doi.org/10.1016/0257-8972(90)90146-4
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Preparation and behaviour of wear-resistant TiC/TiB2, TiN/TiB2 and TiC/TiN coatings with high amounts of phase boundariesSurface and Coatings Technology, 1988
- Low temperature deposition of tribological coatingsSurface and Coatings Technology, 1986
- TiB2-coated cathodes for aluminum smelting cellsThin Solid Films, 1984
- Synthesis and properties of some refractory transition metal diboride thin filmsThin Solid Films, 1983
- Thick boride coatings by chemical vapor depositionThin Solid Films, 1982
- The effect of ion implantation on r.f.-sputtered TiB2 filmsThin Solid Films, 1981
- The chemical vapor deposition of TiB2 from diboraneThin Solid Films, 1980
- The chemical vapor deposition of TiB2 on graphiteJournal of the Less Common Metals, 1979
- Titanium diboride coatings and their interaction with the substratesThin Solid Films, 1978
- Structure and properties of refractory compounds deposited by electron beam evaporationThin Solid Films, 1978