On modeling impact of sub-wavelength lithography on transistors

Abstract

As the VLSI technology marches beyond 65 and 45 nm process technologies, variation in gate length has a direct impact on leakage and performance of CMOS transistors. Due to sub-wavelength lithography, the shape of the transistor often differs from idealized rectangles. In silicon, the effective channel length of a transistor varies across its width. This is a modeling problem. The average effective channel length is different for ON current and OFF currents, making it difficult, if not impossible for a single Leff to accurately represent both. In this paper, we report an accurate post-litho non-rectangular transistor modeling methodology. We further studied the impact of focus and dose variations in lithographic process on transistor parameters. The resulting transistor models were applied for standard cell characterization in successive steps of lithographic simulation of layout and device characterization. Results show that the new models can improve the accuracy of estimation of leakage current by 40% or more over a nominal model that is primarily tuned for ON current.