Characterization of WO3Thin Films Grown on Silicon by HFMOD
Open Access
- 2 September 2013
- journal article
- research article
- Published by Hindawi Limited in Advances in Condensed Matter Physics
- Vol. 2013, 1-9
- https://doi.org/10.1155/2013/591787
Abstract
We studied the effect of annealing temperature on the physical properties of WO3thin films using different experimental techniques. WO3has been prepared by hot-filament metal oxide deposition (HFMOD). The films, chemical stoichiometry was determined by X-ray photoelectron spectroscopy (XPS). The monoclinic single-phase nature of the as-deposited films, structure was changed to triclinic structure by annealing them at higher temperatures than 400°C, which has been determined by the X-ray diffraction analysis. By Raman scattering is confirmed the change of crystalline phase, of monoclinic to triclinic, since that lattice vibrational modes of as-deposited WO3and annealed at 500°C present clearly differences. WO3band gap energy can be varied from 2.92 to 3.15 eV by annealing WO3from 0 to 500°C as was obtained by transmittance measurements. The photoluminescence response of the as-deposited film presents three radiative transitions observed at 2.85, 2.41, and 2.04 eV that could be associated with oxygen vacancies; the first one is shifted to higher energies as the annealing temperature is increased due to the change of crystalline phase of the WO3.Keywords
This publication has 30 references indexed in Scilit:
- Influence of Coloring Voltage and Thickness on Electrochromical Properties of e-beam Evaporated WO[sub 3] Thin FilmsJournal of the Electrochemical Society, 2006
- Structural and optical characterization of WO3 thin films for gas sensor applicationsJournal of Applied Physics, 2005
- Strong photoluminescence of nanostructured crystalline tungsten oxide thin filmsApplied Physics Letters, 2005
- W O 3 ∕ metal thin-film bilayered structures as optical recording materialsJournal of Applied Physics, 2004
- Relaxation processes in the coloration of amorphous WO3 thin films studied by combined impedance and electro-optical measurementsJournal of Applied Physics, 2004
- Laser induced photo-catalytic oxidation/splitting of water over α-Fe2O3, WO3, TiO2 and NiO catalysts: activity comparisonChemical Physics Letters, 2004
- Photochromic properties of WO3 and WO3:X (X=Ti, Nb, Ta and Zr) thin filmsSolid State Ionics, 2003
- Investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide thin filmsJournal of Vacuum Science & Technology A, 2003
- Transient photoconductivity properties of tungsten oxide thin films prepared by spray pyrolysisJournal of Applied Physics, 2001
- Gasochromic mechanism in a-WO3 thin films based on Raman spectroscopic studiesJournal of Applied Physics, 2000