Exploration of the deposition of submicrometer particles by spin-coating
- 1 February 1995
- journal article
- Published by Springer Science and Business Media LLC in Journal of Materials Research
- Vol. 10 (2), 411-424
- https://doi.org/10.1557/jmr.1995.0411
Abstract
The deposition of Cu, Zn, Pt, and Co precursor particles from solution onto a flat silicon wafer using a spin coater was studied. Homogeneously distributed monodisperse particles can be obtained. The dependence of particle size and number density on solution concentration and rotation frequency was investigated. Different solvents and support modifications were studied. The particles were analyzed using dark-field microscopy, scanning electron microscopy, and atomic force microscopy.Keywords
This publication has 17 references indexed in Scilit:
- Low-Temperature Oxidation of CO over Gold Supported on TiO2, α-Fe2O3, and Co3O4Journal of Catalysis, 1993
- Formation of submicrometer patterns by crystallization from solutionChemistry of Materials, 1993
- Nucleation, Growth, and TEM Analysis of Metal Particles and Clusters Deposited in UHVCatalysis Reviews, 1993
- Molecular structure and thickness of highly oriented poly(tetrafluoroethylene) films measured by atomic force microscopyJournal of Materials Science, 1993
- Colloidal Semiconductor Q‐Particles: Chemistry in the Transition Region Between Solid State and MoleculesAngewandte Chemie-International Edition, 1993
- The Evolution of Silicon Wafer Cleaning TechnologyJournal of the Electrochemical Society, 1990
- Study of multilayer surface oxidation of platinum by electrical resistance techniqueSurface Science, 1978
- Friction and molecular structure: the behaviour of some thermoplasticsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1972
- Constitution of Binary AlloysJournal of the Electrochemical Society, 1958
- The flow due to a rotating discMathematical Proceedings of the Cambridge Philosophical Society, 1934