Sigma7100 is a revolutionary new architecture for Laser Pattern Generators being developed by Micronic Laser Systems. The Sigma7100 system design uses a unique architecture based on a spatial light modulator (SLM), a MEMS consisting of a 1 million pixel micro-mirror array fabricated onto a CMOS substrate. The SLM functions as a dynamic mask which is illuminated by a 1kHz DUV excimer laser. A new pattern is calculated and downloaded into the SLM for each laser pulse, and the resultant SLM image is then projected on to the mask substrate. This paper describes the Sigma7100 architecture, presents recent results, and presents a look into the path toward extending the SLM technology to the 70nm node and beyond.