Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering
- 28 February 2011
- journal article
- Published by Elsevier BV in Solid State Sciences
- Vol. 13 (2), 314-320
- https://doi.org/10.1016/j.solidstatesciences.2010.11.019
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Enhanced p-type conductivity and band gap narrowing in heavily Al doped NiO thin films deposited by RF magnetron sputteringJournal of Physics: Condensed Matter, 2009
- Nanostructured mesoporous nickel oxide thin filmsNanotechnology, 2007
- Fabrication of n–p junction electrodes made of n-type SnO2 and p-type NiO for control of charge recombination in dye sensitized solar cellsSolar Energy Materials and Solar Cells, 2004
- Reactively sputtered zirconium nitride coatings: structural, mechanical, optical and electrical characteristicsSurface and Coatings Technology, 2003
- Magnetic properties and x-ray photoelectron spectroscopy study of NiO/NiFe films prepared by magnetron sputteringJournal of Applied Physics, 2001
- Electrochromism of 3d transition metal oxidesSolar Energy Materials, 1991
- Solar thermal absorbers employing oxides of Ni and CoSolar Energy Materials, 1984
- p‐Type NiO as a Photoelectrolysis CathodeJournal of the Electrochemical Society, 1981
- Electrical and Optical Properties of Narrow-Band MaterialsPhysical Review B, 1970
- Photoconductivity in Disordered Nickel-Oxide FilmsPhysical Review Letters, 1969