Limitation of Ti/TiN diffusion barrier layers in silicon technology
- 31 December 1985
- journal article
- Published by Elsevier BV in Vacuum
- Vol. 35 (12), 547-553
- https://doi.org/10.1016/0042-207x(85)90314-8
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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