Electrical characterization of GaN p-n junctions with and without threading dislocations

Abstract

The effect of dislocations on the electrical characteristics of GaN $\mathrm{p-n}$ junctions has been examined through current–voltage measurements. Lateral epitaxial overgrowth (LEO) was used to produce areas of low dislocation density in close proximity to areas with the high dislocation density typical for growth on sapphire. A comparison of $\mathrm{p-n}$ diodes fabricated in each region reveals that reverse-bias leakage current is reduced by three orders of magnitude on LEO GaN. Temperature-dependent measurements on the LEO diodes indicate that the remaining leakage current in these devices is associated with a deep trap level.