Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition
- 12 January 2005
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 17 (3), 536-544
- https://doi.org/10.1021/cm0486666
Abstract
No abstract availableKeywords
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