MOCVD of Al2O3 Films Using New Dialkylaluminum Acetylacetonate Precursors: Growth Kinetics and Process Yields

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7 March 2001

journal article
research article
Published by Wiley in Chemical Vapor Deposition

Vol. 7 (2), 69-74
https://doi.org/10.1002/1521-3862(200103)7:2<69::aid-cvde69>3.0.co;2-q

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Cited by 17 articles