Atomic layer deposition of Al2O3, ZrO2, Ta2O5, and Nb2O5 based nanolayered dielectrics
- 31 May 2002
- journal article
- Published by Elsevier BV in Journal of Non-Crystalline Solids
- Vol. 303 (1), 35-39
- https://doi.org/10.1016/s0022-3093(02)00961-4
Abstract
No abstract availableKeywords
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