Modified transmission line model and its application to aluminum ohmic contacts with n-type GaN
- 1 April 2004
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 84 (14), 2584-2586
- https://doi.org/10.1063/1.1704855
Abstract
A modified transmission line model (MTLM) of ohmic contactmeasurement is presented. This model preserves the simplicity of the circular transmission line model but eliminates the shortcoming of the possibility of obtaining misleading results. This model was applied to n -type GaN ohmic contacts and results similar to those obtained by Hall measurement were obtained. The ohmic contact pattern used in MTLM method occasionally exists during the fabrication of several devices. In such cases, the method can be used to determine the device processing quality without the need for any other test pattern.Keywords
This publication has 14 references indexed in Scilit:
- In situ Mg surface treatment of p-type GaN grown by ammonia-molecular-beam epitaxy for efficient Ohmic contact formationApplied Physics Letters, 2003
- Formation of epitaxial Au/Ni/Au ohmic contacts to p-GaNApplied Physics Letters, 2002
- High-transparency Ni/Au bilayer contacts to n-type GaNJournal of Applied Physics, 2002
- Low-resistance nonalloyed ohmic contact to p-type GaN using strained InGaN contact layerApplied Physics Letters, 2001
- Low-Resistance Ohmic Contacts to AlGaN/GaN Heterostructure Using Si/Ti/Al/Cu/Au Multilayer Metal SchemeJapanese Journal of Applied Physics, 2000
- Cr/Al and Cr/Al/Ni/Au ohmic contacts to n-type GaNJournal of Applied Physics, 2000
- Investigation of AuGeNi contacts using rectangular and circular transmission line modelSolid-State Electronics, 1992
- Investigation of ring structures for metal-semiconductor contact resistance determinationThin Solid Films, 1987
- The effects of contact size and non-zero metal resistance on the determination of specific contact resistanceSolid-State Electronics, 1982
- Specific contact resistance using a circular transmission line modelSolid-State Electronics, 1980