Abstract
High‐resolution charge patterns at various charge densities were written on Teflon TFE foils using a 10‐kV electron beam with a 1/2‐μm spot diameter. Resolutions of 50–100 line pairs/mm were observed by examination with an electron beam and use of xerographic development techniques. Charge spreading in the Teflon and the examination processes were among the factors limiting resolution. Development of stored patterns up to 3 months after their writing showed that resolutions of 100 line pairs can be maintained for this period. Comparison of the results for heat‐sealed samples with those for nontreated samples showed an absence of any marked pattern deterioration due to heat sealing.

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