High-efficiency silicon-compatible photodetectors based on Ge quantum dots

Abstract

We report on high responsivity, broadband metal/insulator/semiconductor photodetectors with amorphous Ge quantum dots (a-Ge QDs) as the active absorbers embedded in a silicon dioxide matrix. Spectral responsivities between 1–4 A/W are achieved in the 500–900 nm wavelength range with internal quantum efficiencies (IQEs) as high as $\sim 700\mathrm{\%}$ . We investigate the role of a-Ge QDs in the photocurrent generation and explain the high IQE as a result of transport mechanisms via photoexcited QDs. These results suggest that a-Ge QDs are promising for high-performance integrated optoelectronic devices that are fully compatible with silicon technology in terms of fabrication and thermal budget.