Atomic Layer Deposition of Co3O4 Thin Films Using a CoI2/O2 Precursor Combination
- 18 April 2006
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 12 (4), 209-213
- https://doi.org/10.1002/cvde.200506447
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- Exploration of oxide-based diluted magnetic semiconductors toward transparent spintronicsApplied Surface Science, 2004
- High Temperature Ferromagnetism with a Giant Magnetic Moment in Transparent Co-dopedPhysical Review Letters, 2003
- Cobalt oxide based gas sensors on silicon substrate for operation at low temperaturesSensors and Actuators B: Chemical, 2003
- Electrochemical deposition of Co3O4 thin layers in order to protect the nickel-based molten carbonate fuel cell cathodeJournal of Electroanalytical Chemistry, 2003
- Electrochemical and structural properties of radio frequency sputtered cobalt oxide electrodes for thin-film supercapacitorsJournal of Power Sources, 2001
- Step potential analysis of cobalt oxide-based electrochromic devicesSolar Energy Materials and Solar Cells, 2001
- Spintronics: A Spin-Based Electronics Vision for the FutureScience, 2001
- Studies on electrochromism of spray pyrolyzed cobalt oxide thin filmsSolar Energy Materials and Solar Cells, 1998
- Preparation and characterization of thin Co3O4 and MnCo2O4 films prepared on glass/SnO2:F by spray pyrolysis at 150 °C for the oxygen electrodeThin Solid Films, 1995
- Cobalt oxide thin films prepared by chemical vapor deposition from cobalt (II) acetateSolar Energy Materials, 1991