Silicides and ohmic contacts
- 28 February 1998
- journal article
- review article
- Published by Elsevier BV in Materials Chemistry and Physics
- Vol. 52 (2), 99-146
- https://doi.org/10.1016/s0254-0584(98)80014-x
Abstract
No abstract availableKeywords
This publication has 100 references indexed in Scilit:
- Contaminations and Impurities in DC Magnetron Sputtered WSix Films on SiO2physica status solidi (a), 1995
- Integrated system for deposition of polysilicon and WSix filmsMicroelectronic Engineering, 1994
- Thermodynamic considerations of thermal oxidation of metal silicidesThin Solid Films, 1992
- Lattice diffusion of boron in bulk cobalt disilicideThin Solid Films, 1990
- Formation and thermal stability of CoSi2 on polycrystalline SiJournal of Applied Physics, 1985
- Formation of thin films of CoSi2: Nucleation and diffusion mechanismsThin Solid Films, 1985
- I n s i t u stress measurement of refractory metal silicides during sinteringJournal of Applied Physics, 1984
- Specific contact resistance of metal-semiconductor barriersSolid-State Electronics, 1971
- Field and thermionic-field emission in Schottky barriersSolid-State Electronics, 1966
- Theory of Thermal GroovingJournal of Applied Physics, 1957